By Mark LaPedus

Taking another shot to displace ARM, Intel recently rolled out its new microarchitecture for its Atom processor line. In a research note, Will Strauss, president of Forward Concepts, said: “How many times have we heard Intel say that its next member of the Atom processor line would finally be competitive with low-power ARM implementations? Every other year, Intel carts out a new variant that will ‘finally’ do the trick.  The next (and fourth?) iteration of the family, code named Merrifield is said to be the ‘turning point’ for the company in mobile phones.  Although the 2012 launch of Medfield-based 3G phones came close, it didn’t put a dent in ARM’s market share. Merrifield will ship in 4Q13 and phones based on the SoC will be announced at MWC in February 2014. But, the application processor is only part of the solution for a successful smartphone chip offering.  Multimode LTE modems and LTE RF transceivers are also necessary.  Yes, the Infineon-heritage RF transceivers have been fielded in Motorola LTE smartphones, but we’re still waiting for Intel’s multimode LTE modem.  It’s our understanding that the Infineon-heritage multimode 2G/3G/HSPA+ (based on CEVA’s DSP cores) will be married to the Blue Wonder-heritage single-mode LTE (based on Tensilica’s DSP cores). Since the software between the two is not compatible, we expect that has led to integration problems and subsequent delays.”

Following a disappointing period in the first quarter of this year, IHS plans to lower its chip forecast to 4.8% for 2013, down from 5.6% in the previous forecast. In 2012, the IC market fell 2.2%, according to the research firm. Mike Splinter, chairman and CEO of Applied Materials, presents his forecast.

In its most recent quarter, Applied Materials generated orders of $2.27 billion, up 7%t from the prior period, with Silicon Systems Group orders up 14% from the first quarter and Display orders up 41% sequentially. Net sales were $1.97 billion, up 25% sequentially.

At SEMI’s recent Silicon Valley Lunch Forum, speakers from Applied Materials, ASML, and Intel discussed the critical challenges of 450mm and EUV.

The infrastructure in Saratoga, N.Y. can’t keep pace with the growth. One local government organization, the Saratoga County Industrial Development Agency, voted to consider issuing GlobalFoundries nearly $70 million in bonds to finance the infrastructure, according to The Saratogian.

Three companies announced RF switches based on SOI or a variant of the technology. Skyworks rolled out some new parts. Peregrine announced a product for harsh environments. And RDA’s RF switches are being used in Samsung’s smartphones.

Mentor Graphics announced that MagnaChip Semiconductor has adopted the Pyxis custom IC design platform and the Mentor process design kit (PDK) automation process.  Mentor Graphics also announced that CNH, a supplier of agricultural and construction equipment, has transitioned to the latest VeSys software platform.

Cadence Design Systems announced that it helped Yamaha reduce power consumption for its mobile consumer chips with characterization tools.

Is TranSwitch on the block? The communications chip maker has retained Needham & Co. as financial advisor to assist the board in evaluating various strategic alternatives available to the company.

Altera has signed a definitive merger agreement to acquire Enpirion, a provider of high-efficiency, integrated power conversion products known as power SoCs (power system-on-chips).

The use of Wi-Fi functionality in small-cell base stations will be a game changer for cellphone service providers, according to IHS.

Android and iOS, the number one and number two ranked smartphone operating systems (OS) worldwide, combined for 92.3% of all smartphone shipments during the first quarter of 2013 (1Q13) as Windows Phone crept past BlackBerry for 3rd place, according to IDC.

By Mark LaPedus
After its formation nearly 20 months ago, a 450mm consortium has reached its latest milestone by recently completing a cleanroom and installing the first 450mm demonstration tools in the facility.

The so-called Global 450 Consortium (G450C) also has set a goal to bring 450mm fabs into high-volume manufacturing at the 10nm or 7nm nodes by 2018. That gives the industry a little less than five years to develop the production tools for 450mm fabs, which are expected to cost a whopping $10 billion or more. Based in Albany, N.Y., the G450C has five members—GlobalFoundries, Intel, IBM, Samsung and TSMC.

But between now and 2018, there is a staggering amount of work to be done. Based on the current progress for select equipment, fab technologies and standards, the path towards 450mm will be a bumpy road and it’s unclear if the industry can meet the 2018 target.

The most obvious problem is lithography. For example, ASML Holding is not expected to deliver a production-worthy, 450mm version of its extreme ultraviolet (EUV) lithography scanner until 2018. Other challenges include lithographic cost-of-ownership and throughput.

On the wafer-processing front, Applied, Lam, TEL and others are moving full speed ahead in 450mm. TEL also is proposing an “open platform” standard—a move that has received a lukewarm response. Meanwhile, there is some movement in metrology, as a new consortium has recently been formed to address the challenges in 450mm.

And the industry is still debating over various 450mm fab standards, such as aisle space and ceiling height. There is even a debate over the type of cranes needed to install 450mm tools. Other standards, such as gas interface boxes, cooling water manifolds, and hookups for power, are also in the works.

That’s just the tip of the iceberg. The goal for the G450C is not only to help develop these technologies, but it also has the arduous task of getting the various players to synchronize on the roadmap. “It’s going to require a collaborative and concerted effort to introduce (450mm technology) in an efficient manner,” said Steve Johnston, director of external programs and technology strategy in the Technology Manufacturing Engineering Group at Intel, at a recent SEMI event. “All of this requires flawless and synchronized execution across the industry and at multiple levels.”

Avoiding past mistakes
Indeed, the industry hopes to avoid past mistakes. In the mid-1990s, the IC industry wanted to make the shift from 200mm to 300mm fabs. The equipment industry had the 300mm tools ready in the late 1990s, but chipmakers pushed out their 300mm fabs amid an IC downturn. Equipment vendors ended up holding the bag and lost a fortune. Shortly thereafter, chipmakers began to ramp up their 300mm fabs, but the events left a bad taste in vendors’ mouths.

Recently, Intel, Samsung and TSMC have been pushing for 450mm fabs. The argument is that the industry needs to make a wafer transition every 15 years to stay on Moore’s Law. Moving to 450mm wafers will give chipmakers a 2.25x boost in wafer area and a 30% cost reduction, according to chipmakers.

For some time, however, fab tool vendors were lukewarm about 450mm. There are only a handful of customers who would buy 450mm tools, and it’s unclear who will foot the R&D bill for the technology.

More recently, 450mm has become a reality. Intel and TSMC have outlined plans to build 450mm fabs. And in 2011, the G450C was established at the College of Nanoscale Science and Engineering’s NanoTech Complex. The G450C recently opened a cleanroom. Its roadmap also calls for 450mm pilot lines in 2015 and 2016, with high-volume production targeted for 2018.

“Synchronization and collaboration are very important to avoid the same type of issues we ran into in the late 1990s with the transition to 300mm,” said Kirk Hasserjian, corporate vice president for the Silicon Systems Group at Applied Materials.

There are other issues, namely supply-chain readiness, return-on-investment and R&D funding. “The (R&D funding) issue requires a very different business model,” Hasserjian said. “That has not been completely resolved. We have the consortium activities, which have provided some level of funding.”

Fab tool challenges
The industry has moved to fund at least one technology, namely lithography. Intel, Samsung and TSMC recently invested in ASML, in an effort to accelerate ASML’s efforts in 450mm and EUV. And with separate funding from Intel, Nikon is developing a 193nm immersion scanner for 450mm.

ASML itself has initiated 450mm programs on two separate platforms and four wavelengths, including EUV. The goal is to deliver “early version tools” in 2015 to 2016, with 450mm production systems due out by 2018, said Jim Koonmen, general manager of Brion Technologies, a division of ASML.

The development of a 450mm EUV scanner is expected to be a herculean effort. Today, ASML is struggling to deliver 300mm EUV tools amid delays with the power sources. Cost is also an issue, as ASML’s pre-production EUV scanners cost $100 million or more per unit today.

Throughput is also an issue. The throughput for a 450mm scanner in general is projected to be only about one-half of a 300mm tool, Koonmen said. A 300mm tool has a throughput of about 250 wafers per hour (wph), while a 450mm system can run 100-125 wph at 1.1x the cost, he said.

“If you look at the entire semiconductor process, there are steps that do get a lot of leverage from larger wafer sizes and can realize cost reduction,” he said. “Unfortunately, with lithography, there simply isn’t that much of a benefit in going to larger wafer sizes. We are scanning as fast as we can. The number of fields is going to increase when we go to larger wafers, but that just means your throughput for each 450mm wafer is going to go down. So you’ve got double the number of fields, but you are going at half the throughput. That in itself is not easy to do. In order to handle a 450mm wafer, you need to have larger stages with larger masks, and that creates a whole bunch of issues for us.”

Meanwhile, amid the problems with EUV, the industry is hedging its bets by developing 193nm immersion scanners for 450mm. Optical is a proven technology, but the solution is expensive. At 10nm or 7nm, chipmakers must also use expensive multiple patterning schemes.

Delivery schedules for 193nm immersion are more certain, however. “450mm is expected to be in production by 2018,” said Hamid Zarringhalam, executive vice president at Nikon Precision. “We will ship development tools earlier than that.” By 2015, Nikon plans to ship “early learning tools” based on 193nm immersion for 450mm, Zarringhalam said. Nikon has already garnered “multiple orders” for the systems, he added.

On the wafer processing side, there are also some technical and cost challenges. “Prices could rise 30% to 50% for 450mm tools, as they did when the wafer size shifted to 300mm from 200mm,” said analyst David Motozo Rubenstein, who is also the author of a blog entitled “Chips and Dips.”

Applied, Lam, TEL and others are developing standalone 450mm tools. TEL also is proposing the idea of having an “open and modular platform” for 450mm. This would enable fab tool vendors to develop various plug-and-play process modules for the open platform, thereby reducing costs and development times. TEL and its rivals could develop modules for the platform. “The open platform is a concept for the 450mm high-volume manufacturing era,” said Aki Sekiguchi, vice president and general manager for SPE marketing at TEL.

The open platform could benefit smaller companies that don’t have the resources to develop standalone tools. But larger companies are not eager to endorse an open platform, because it will give its rivals a competitive edge. “We are looking at it,” said Applied’s Hasserjian. “We are not doing what TEL is doing and advocating a modular platform.”

Metrology challenges

Another challenge is the development of 450mm metrology gear. “There are not many companies that can invest six years in advance,” said Menachem Shoval, chairman of Metro450, an Israeli-based consortium that is developing 450mm metrology technology. “Even without going 450mm, there are huge challenges for metrology in terms of going down from 22nm to 14nm to 10nm to 7nm.”

This is especially true when moving from today’s planar devices to finFETs at 22nm and beyond. “Going to 3D has created numerous challenges for us,” said John Allgair, senior member of the technical staff at GlobalFoundries. “We see tenfold measurement problems as we go to 3D. A lot of things you see in 2D tend to get amplified as we go to these 3D structures. Then, we see some real challenges when it comes to compositional analysis. In finFET devices, we’ve got compositional measurements like SiGe with a percentage of germanium and a percentage of boron on a 3D structure. That’s a very complex measurement. Finally, we try and do measurements on test structures. The test structures don’t always mimic what’s actually taking place on your device. That really adds to the complexity of trying to manufacture finFETs in a stable manner.”

One solution to the problem is to collaborate through a consortium, Metro450′s Shoval said. Last year, for example, the Metro450 consortium was formed by the following companies—Applied Materials, Nova, Jordan Valley, Nanomotion and Intel. The group also consists of four universities in Israel, with some 60% of the funding coming from the Israeli government.

“Each company develops its own technology,” Shoval said. “They are competing with each other. But we can collaborate on those parts which are common. We will work on platforms, but not on detection.”

One of the goals for the Metro450 group is to meet the design rule targets by 2017. It is also devising technologies that are 2.5x faster than 300mm, thereby meeting the cost requirements for 450mm. To reach its goals, the group is working on five specific technologies: wafer handling; sampling optimization; wafer damage and contamination; calibration; and data processing.

“We plan to complete our work in three years,” Shoval said. “So companies will still have about three years to complete the development of their high-volume manufacturing tools.”

By Mark LaPedus
Semiconductor Manufacturing & Design sat down to discuss future lithography challenges with Serge Tedesco, lithography program manager at CEA-Leti; Laurent Pain, lithography lab manager at CEA-Leti; and Raluca Tiron, a senior scientist at CEA-Leti.

SMD: CEA-Leti has two major and separate programs, including one in directed self-assembly (DSA) and another in multi-beam e-beam. Let’s start with DSA. What is CEA-Leti doing in DSA?
Pain: For DSA, we have what we call the ‘Ideal’ program. We are developing 300mm processes. We have materials development with Arkema. Other partners include TEL and Sokudo. We are working with STMicroelectronics to transfer the technology from a process point of view. We are developing this capability for lab scaling to industry production.

SMD: What have you demonstrated with DSA?
Pain: We have demonstrated resolutions down to 18nm half-pitch, which is considered the 7nm logic node. We think we can extend PS-b-PMMA down to the 7nm node. The concept is to enable 7nm to 4nm resolutions with Arkema’s materials.

SMD: The big question is when do you think DSA will move into production?
Pain: From my point of view, it should be 10nm. You will start to see some demonstrations at 14nm.
Tedesco: You can ask me that in July. I still say 2014.

SMD: What are the challenges with DSA?
Pain: There will be some challenges in terms of defectivity and process maturity.
Tiron: For contact shrinks, the processes are here. It’s stable. That means you can absorb a lot of the variations with the block copolymers. But you don’t have pitch or density. If you move to contact doubling, you have the density. But you lose the process window stability. The placement of the contacts is also less certain. But what is important is now we have materials, processes and tracks. What we really need now is some real fabrication. The applications depend on the end-user. What we need is the end-users to tell us: ‘We need this and that and then move in that direction.’ That’s what is missing today.

SMD: What have you accomplished in your DSA process flow?
Tiron: We have implemented a process flow on a 300mm track, which comes from Sokudo. We have a complete DSA process cycle in one track. The track handles the brush coat and block copolymer coating. The track also has high temperature hot plates for block copolymer cure. We also worked with Sokudo to develop a PMMA removal process. We demonstrated different exposure treatments and solvents. What we are trying to do now is address contact hole shrinks and contact multiplication. With the polymers from Arkema, we are able to do resolutions from 20nm period, which means 10nm resolution, to 60nm period, which means 35nm resolution. Contact shrink is possible using both cylindrical and lamellar morphologies.

SMD: What about yield or defects?
Tiron: We have shown good uniformities with three sigma around 2nm. After the optimization of the process, we counted 6,800 divisional points on the wafer. We only found five missing contacts. By using block copolymers, we showed 99.93 % valid contacts on the wafer. This is just using PMMA.

SMD: Let’s move to multi-beam. What is CEA-Leti doing in multi-beam?
Pain: The second program is called Imagine. This program started last year. We have a partnership with (multi-beam e-beam vendor) Mapper Lithography. Other partners include Aselta, JSR, TOK, TSMC, Sokudo, Dow, STMicroelectronics, TEL and Mentor.

SMD: How far along is Mapper’s multi-beam tool?
Pain: The first machine will consist of 1,300 beams. The throughput is one wafer per hour. The tool will arrive the beginning of June. That’s targeted for the 14nm logic node. This machine will be interfaced with the Sokudo track. The first exposures will start in the last quarter of this year. Eventually, the target is to reach 16nm half-pitch. Our goal is to have 13,000 beams with the Mapper tool. We expect to scale the throughput from one wafer per hour to 10 wafers an hour. Then, we plan to push the resolutions down to 10nm half-pitch.

SMD: What is the cost-of-ownership for the Mapper tool?
Pain: The cost is 1 million euros for two wafers per hour. So in other words, that’s 5 million euros for 10 wafers per hour. Our eventual goal is to cluster 10 machines together. That’s 50 million euros for the cluster configuration.

SMD: Isn’t multi-beam taking longer than expected and behind schedule?
Pain: If you take the original roadmap, we are late. Some of the technical achievements have taken a long time.
Tedesco: One of the problems is there is a lack of support from the industry. It’s a shame that there is a lack of support, when you look at what’s being done on the EUV side. That’s one of the reasons that multi-beam is not mature yet. Of course, there is the technical aspect. TSMC, of course, is the one that is pushing this technology. But beyond TSMC, there is a lack of support. But I think the support will eventually come.

SMD: TSMC has stated it wants to do all layers with multi-beam. Is that practical or will multi-beam end up doing traditional direct-write applications like ASICs?
Tedesco: It could be a challenge to do all layers with multi-beam. But a maskless tool could be useful in terms of ASICs or prototyping. It’s ideal for the foundries. But the first applications for multi-beam will likely be contact holes and the cut layer.

SMD: How about STMicroelectronics? STMicroelectronics has been involved with direct-write for many years.
Tedesco: ST is a partner of Leti. So they are following Imagine very closely.

SMD: What about funding for multi-beam from the likes of Intel, GlobalFoundries and Samsung?
Tedesco: Good question. What we can say is that they are following us very closely. They know what we are doing. At this point, they are not part of the program.

The introduction of EUV lithography into the semiconductor fabrication process will enable a continuation of Moore’s law below the 22 nm technology node. EUV lithography will, however, introduce new and unwanted sources of patterning distortions which must be accurately modeled and corrected on the reticle. Flare caused by scattered light in the projection optics is expected to result in several nanometers of on-wafer dimensional variation, if left uncorrected. Previous work by the authors has focused on combinations of model-based and rules-based approaches to modeling and correction of flare in EUV lithography. This paper focuses on the development of an all model-based approach to compensation of both flare and proximity effects in EUV lithography. The advantages of such an approach in terms of both model and OPC accuracy will be discussed. In addition, the authors will discuss the benefits and tradeoffs associated with hybrid OPC approaches which mix both rules-based.

To view this white paper, click here.

By Mark LaPedus
Japan’s Ushio will discontinue its R&D for EUV light sources and will sell its EUV service business to ASML. That means the market has only two EUV source vendors—ASML’s Cymer unit and Gigaphoton. “Ushio’s subsidiary, Xtreme Technologies, competes with Cymer, which was recently acquired by ASML, thus symbolizing an endorsement of Cymer’s EUV technology. Ushio will gain cost savings in both fixed costs and variable costs as 30 staff in their German facility will be shifted under ASML’s umbrella. Although the termination of this business is disappointing, it does reduce future risk of high R&D costs as well as lowering current costs,” said analyst David Motozo Rubenstein in his blog called Chips and Dips.

Taking another shot to displace ARM in the mobile, tablet and other markets, Intel rolled out its new and long-awaited microarchitecture for its Atom processor line.

SEMI applauded the White House announcement that President Obama decided to visit Applied Materials’ facilities in Austin, Texas. This was part of his focus on manufacturing jobs, high-tech skills and technology that will drive long-term economic growth. The administration’s announcement cited Applied Materials’ contribution to innovation and job creation.

While faced with difficult technology and investment choices in R&D, there is now increased pressure on the component-level supply chain, according to Michael Lercel, director of nanodefectivity and metrology at Sematech, in SEMI’s newsletter.

Worldwide silicon wafer area shipments decreased during the first quarter 2013, when compared to fourth quarter 2012 area shipments according to the SEMI.

KC Ang, senior vice president and general manager of GlobalFoundries Singapore, has been appointed to serve SEMI Singapore Regional Advisory Board (RAB) as their new chairman.

Cadence announced its intent to acquire the IP business of Evatronix, adding to its rapidly expanding IP offering.

Cadence also introduced a new version of Incisive Enterprise Simulator, which improves low-power verification productivity of complex SoCs by 30%.

Mentor Graphics announced availability of the newest tool in the Capital software suite, Capital Harness TVM. This tool automatically generates detailed harness manufacturing process and cost data that is specific to each harness design, each factory and each company’s cost models.

SRC and NIST announced the second phase of the Nanoelectronics Research Initiative (NRI). For this phase, SRC and NIST will provide a combined $5 million in annual funding for three multi-university research centers tasked with demonstrating non-conventional, low-energy technologies that outperform current technologies on critical applications in 10 years and beyond.

On the outside, the U.S. and South Korean versions of Samsung Electronics’ Galaxy S4 smartphone look alike. But on the inside, there are differences in key components, according to IHS. Global shipments of solid state drives (SSD) in PCs are set to rise by a factor of seven by 2017, allowing them to claim more than one-third of the market for PC storage solutions by that time, according to an IHS.

The high-flying acceleration and sensor product category was brought back to earth in 2012 when price erosion pulled down annual sales growth to 7%—the lowest percentage increase for motion-sensing semiconductors since 2005, according to IC Insights.

After falling 15% in 2012, solar photovoltaic wafer production is forecast to grow 19% in 2013, passing 30 GW and recovering to the 2011 level, according to NPD Solarbuzz. However, industry utilization is expected to remain below 60%.

Natural gas vehicles (NGVs) on the road in the world’s seven largest automobile markets will reach only 7.5 million as the industry struggles to capitalize on cheap shale-driven natural gas, Lux Research said.

By Mark LaPedus
At last year’s SPIE Advanced Lithography conference, Christopher Bencher, a member of the technical staff at Applied Materials, said the buzz surrounding directed self-assembly (DSA) technology resembled the fervor generated at the famous Woodstock rock concert in 1969.

This was clearly evident from the tumultuous and free-flowing movement that threatened the status quo over the potential use of DSA, an alternative patterning technology that enables fine pitches through the use of block copolymers.

A year later, DSA has joined the lithography establishment. Amazingly, within a short time span, DSA has moved from a mere curiosity item into the R&D mode at GlobalFoundries, IBM, Intel, Samsung and TSMC. “Companies are taking DSA seriously,” said Bencher, a DSA expert. “If you compared it to last year, we are now in the pre-competitive stage with DSA. The people in DSA have all grown up and are now wearing suits and ties.”

For some time, most chipmakers have kept their DSA efforts shrouded in secrecy. At the recent SPIE event, however, chipmakers finally provided the first glimpse of their initial work and results.

Based on the early findings, DSA still has a way to go before it moves into IC production. Chipmakers are just getting their arms around the problems. And they are still experimenting with an assortment of fab tools, flows, chemistries and design methodologies.

Still, the initial findings are also promising, providing a clue to where DSA is heading. For example, using DSA, Intel demonstrated 28nm structures. Separately, GlobalFoundries devised 28nm fins with DSA. IBM developed a silicon-on-insulator (SOI) DSA flow. And Samsung may have found the path towards sub-20nm DRAMs.

It’s still unclear when DSA will reach production. The projections range from the 14nm to 7nm nodes. “If you ask different people, you will get different answers,” said Joy Cheng, a research staff member at IBM.

DSA: From the lab to the fab?
DSA is not a next-generation lithography (NGL) tool per se, but rather it is a complementary and double-patterning scheme. DSA is also disruptive and threatens the status quo, because the process isn’t dependent on traditional and costly lithography. Many of the key processing steps are conducted in an existing wafer track system.

There are two basic types of DSA methods: graphoepitaxy and chemical epitaxy. In graphoepitaxy, a guide is patterned using existing lithography tools. Using a track, the guide is spin-coated, rinsed and spin-coated again with copolymers. The copolymers self-assemble and the guide is then etched. In chemical epitaxy, self-assembly is guided by lithographically determined chemical patterns.

In theory, DSA is attractive because it could reduce the overall cost of lithography. And compared to EUV, DSA requires less R&D funding.

“We don’t need billions of dollars,” said Ralph Dammel, chief technology officer for AZ Electronic Materials, a supplier of materials for DSA and other applications. “Materials development is inherently cheaper than tool development. The current funding is probably adequate to get the industry going for the 14nm node with DSA. If we’re talking about high chi polymers, which will be needed for the 10nm node and beyond, the industry should think about different funding mechanisms. But even so, we are not talking about huge sums.”

Meanwhile, over the last year, Albany Nanotech, CEA-Leti and IMEC have set up 300mm R&D pilot lines for DSA. Major chipmakers are doing their R&D work within these organizations. “Basically, DSA is still in the R&D stage,” said Charles Pieczulewski, director of strategic marketing for Sokudo, a wafer track supplier. “The industry is still working through the bugs with the materials.”

Going forward, the challenge is to bring DSA into the IC design and production phases. “The main challenge is device integration,” said Ben Rathsack, strategic marketing and technology manager at Tokyo Electron Ltd., the world’s largest wafer track supplier.

Last year, Applied’s Bencher listed defectivity as the top challenge for DSA, followed in order by registration, design flexibility and positional accuracy. For 2013, positional accuracy—or the ability to align the block copolymers in the proper place—has moved to the biggest challenge for DSA, Bencher said.

Bencher expects memory makers will be the early adopters for DSA, followed by logic and foundry vendors. The prediction is based on the ability to generate IC designs using DSA. “You hear people saying: ‘We need a whole design ecosystem to enable DSA.’ That might be true for logic, but these are the last people that would implement DSA. This is because you need the most flexible designs in logic,” Bencher said. “Memory makers don’t really need that whole design ecosystem. They need maybe 1% of the EDA ecosystem, compared to the logic people.”

Currently, there are several design approaches for DSA. One idea is using 1D gridded arrays, but the problems are obvious. “Designers don’t want to be restricted to having contacts only on a grid or vias on a grid,” Bencher said.

Another concept is laying down a sea of holes or fins on a pattern. “In the chemical epitaxy approach, you make holes everywhere to start with. Later, you will do a lithographic step, where you select which ones you want to keep and which ones you want to get rid of. But the problem is that the aerial image can be very sloppy,” he said.

And in another approach, Stanford University is developing an arbitrary design methodology for DSA using an alphabet soup of characters. In this approach, positional accuracy with the contact holes is the biggest challenge.

Chipmakers tip DSA efforts
Design is just one of the many challenges facing silicon foundries with DSA. For example, GlobalFoundries has set up a DSA R&D line at Albany Nanotech. Using chemical epitaxy, the company demonstrated three-stack, 28nm silicon fin structures. It also is experimenting with a graphoepitaxy flow.

“The advantage for using chemical epitaxy is that there is no loss for aerial density,” said Richard Farrell, a principal engineer at GlobalFoundries. “The advantage in working with graphoepitaxy is that it involves a relatively simple process. Some of the challenges that we face for graphoepitaxy is the translation of the edge roughness into the DSA pattern itself. For line/space, we need temperatures above 200 degrees. This has additional constraints on the lithographic performance of the resists.”

Bringing up DSA in a fab is another issue. “First, we have to deal with fab-compatibility in DSA processing,” he said. “There are contamination issues. In pattern transfer, we need to think about balance reflectivity and the use of planarization.”

Despite the challenges, chipmakers are moving full speed ahead with DSA—and for good reason. For example, NAND flash vendors are pushing 193nm immersion and multi-patterning to the limits, but suppliers are in dire need of a new solution. “EUV lithography and double patterning are widely known (to handle) sub-20nm patterning,” said Jaewoo Nam, a lithography engineer at Samsung, at the recent SPIE conference. “But EUV has some limitations. The pattern resolution for EUV is 16nm only. The cost is huge. Double patterning is also very complicated.”

Using DSA, Samsung is exploring the possibility of developing DRAMs at 18nm. Samsung’s initial goal with DSA is to devise 20nm contact holes. In a DSA R&D line, the company has implemented a graphoepitaxy flow using block PS-b-PMMA materials. With a proprietary treatment process, Samsung has improved the CD distribution by 28%, Nam said.

Like Samsung, Intel also is bullish about DSA. “DSA sparks off a dozen different ideas,” said Sam Sivakumar, a fellow and director of lithography at Intel. The possible applications for DSA include contact holes, vias, and the back-end-of-the-line (BEOL) flow, he said.

Intel is conducting its DSA R&D at IMEC. Last year, IMEC set up a 300mm DSA R&D line, which consists of TEL’s track systems. Using the University of Wisconsin flow, Intel devised a three-layer, 28nm stack. The stack includes an interconnect, via and a metal 1 layer.

Intel started with staggered contact hole arrays on a grid at 50nm to 55nm. After the pattern transfer process, the holes were reduced to 26nm to 22nm, representing a 35% shrink. With a blended DSA formula from JSR, Intel obtained the targeted resolutions with good results, said Todd Younkin, a lithography materials researcher at Intel. However, the results were less conclusive with traditional block copolymers, which are provided by both AZ Electronic Materials and Dow.

Another R&D organization, CEA-Leti, last year set up a 300mm DSA pilot line, which uses Sokudo’s track systems. Using PS-b-PMMA from Arkema and a graphoepitaxy process flow, CEA-Leti achieved resolutions from 35nm to 10nm, said Raluca Tiron, a senior scientist at CEA-Leti. “We showed good uniformity with three sigma around 2nm,” she said. “After the optimization of the process, we counted 6,800 divisional points on the wafer. We only found five missing contacts.”

PS-b-PMMA is expected to hit the wall at 10nm, meaning the industry must develop next-generation high chi DSA materials. Others see it differently. “We think we can extend PS-b-PMMA down to the 7nm node,” said Laurent Pain, lithography lab manager at CEA-Leti.

Another player, IBM, is involved in several different DSA efforts. In one effort, IBM demonstrated a larger-pitch 42nm flow, which could one day enable the development of smaller chips based on SOI. In this experiment, IBM used both the Almaden and University of Wisconsin flows, which enabled 42nm and 28nm resolutions. “If we can do self-assembly at 42nm, we can do assembly at smaller pitches,” said Chi-Chun Liu, a research staff member at IBM.

By Mark LaPedus
Semiconductor Manufacturing & Design sat down to discuss the trends in lithography with Mark Melliar-Smith, president and chief executive of Molecular Imprints Inc. (MII), a supplier of nanoimprint lithography tools.

SMD: How do you view the IC industry now?
Melliar-Smith: It’s truly incredible work that this industry continues to do. The industry will see its way for the next 10 years. But to some extent, there are storm clouds on the horizon. This incredible complexity eventually looks like it may get a little out of control. We have to see what happens.

SMD: What will drive the demand for ICs in the future?
Melliar-Smith: There is a never-ending demand for more complex capabilities coming from the consumer. For example, there is an increasing amount of memory that needs to be stored in the cloud or on a mobile system. In addition, there is an enormous demand for bandwidth.

SMD: Why are lithography costs soaring out of control?
Melliar-Smith: We are in an era of increasing complexity and cost. The complexity comes in two varieties. The first complexity comes in the restrictions placed on the designers. That makes the designs less efficient and more difficult. The other part of the complexity comes just from the fact that you are starting to do double patterning. There are more steps to do it all. The complexity, of course, always comes with increased costs.

SMD: So is lithography heading for a train wreck?
Melliar-Smith: If I take a larger view of lithography, I could charge lithography the extraneous costs, including the inefficiencies of designs. Now, you are getting to the point where the productivity is beginning to come off the tracks in terms of how many millions of transistors per dollar I get. It’s not a train wreck, but it’s more of a challenge to really get the same learning curves we had before.

SMD: Any comments on EUV?

Melliar-Smith: EUV is a very difficult technology. I admire the people and what they’ve been able to do. The challenges get exponentially more difficult every year it’s late.  It’s been so delayed now that the dimensions that people want to use it for are down to well below 20nm. And at that point, you have a tough problem. The number of photons is much less than what you have at 193nm. It’s like by a factor of 30 less. So you have these very energetic photons flying in and the chemical debris goes into different directions. So it is not easy to solve that problem at 15nm. You also worry about shot noise and line-edge roughness.

SMD: What is the progress of nanoimprint lithography?
Melliar-Smith: We are actually making good progress. Obviously, as you know, if you want to go in and turn over the existing litho technology in today’s fabs, then that’s probably the toughest challenge you could have. People are justifiably conservative. The reason why we are getting a lot of traction now is that the benefits are becoming very noticeable.

SMD: What are the benefits of nanoimprint?
Melliar-Smith: First of all, we have no wavelength imaging issues. So, we can do single imprints or single patterning down towards 10nm. Second, we have far fewer design rule restrictions. We are not in the position of giving a design rule book that is like a telephone book, with all of the things you can’t do. We also don’t use high-speed photo chemistry to image. If you are imaging on a wafer, you are shining this image down and must do some chemistry on a resist. But as you get to smaller and smaller features, the problem gets tougher. So you get shot noise and line-edge roughness problems. We don’t have any of this. We bring the potential for much lower cost.

SMD: What markets are you targeting in semiconductors?
Melliar-Smith: Our target for initial production would be the memory space, particularly flash. The resolution requirements are the most extreme.

SMD: Toshiba is one of your customers. Is Toshiba in NAND production using nanoimprint yet?

Melliar-Smith: No. They are not in production yet. You have to ask them what their plans are. But clearly, they see the potential for the technology. In the memory space, people don’t talk very much about what they are doing. It’s hard to get our customers to stand up and champion us publicly.

SMD: The knock on nanoimprint is defectivity, overlay and throughput. What’s the latest on that?

Melliar-Smith: The long pole in the tent has always been defectivity. In the last couple of years, we’ve made huge progress. We are now down to the point where we believe our defectivity is close enough, that there is significant consideration for production in memory using nanoimprint. The advantage in memory, of course, is that you have redundancy built into the device. So the acceptable defect level is much higher than it is in logic. We believe the defect issues, and the ability to make 1X masks, looks like they are well under way for a solution.

SMD: What are the other challenges?
Melliar-Smith: The only challenge we’ve got is to make these very high-resolution masks. At present, the electron-beam pattern generators that write our masks are resolution limited to about 25nm, which is not enough.

SMD: What are the solutions?

Melliar-Smith: There were a couple of papers from SPIE. One is from IMS, which is developing a multi-beam mask writer. IMS is going to bring out a 12nm beta tool in 2015. The other one is from DNP. They showed results using double patterning on the mask to imprint a mask. You do all of the expensive patterning on the master mask. And then you use the master to create a replicate mask. And then you use a replicate mask in the factory. The cost of the master mask is irrelevant in the cost-of-ownership. DNP showed 15nm master masks made by double patterning.

SMD: You are also targeting the 450mm market. You sold a 450mm nanoimprint tool to Intel, right?
Melliar-Smith: We had a 450mm tool, which was billed and accepted by a customer. The customer wants to accelerate the transition to 450mm. To do that, they’ve got to provide patterned wafers to companies like Lam, Applied and TEL.

SMD: MII also has been talking about the disk drive industry. Nanoimprint is targeted for the shift towards bit-patterned media. What’s the status on that?
Melliar-Smith: Given the dynamics of that industry like consolidation and other things, the (disk drive makers) have actually slowed their density roadmap down. So that opportunity for us has been pushed out a couple of years. It’s a matter of if and not when. Hitachi, Seagate and Western Digital all have programs with patterned media using nanoimprint.

SMD: What other markets are you looking at?

Melliar-Smith: Another area we are interested in is working with the polarizers in flat-panel displays. They use polarizers in front of the light source and after the switching matrix. Today, they use organic film polarizers. They’ve known for a long time that a so-called wide-grid polarizer is a better polarizer. That’s an aluminum film on the glass, which is etched into 15nm lines and spaces. It has better transmission. That solution plays to our strengths.

By Mark LaPedus
Amid ongoing delays and setbacks, extreme ultraviolet (EUV) lithography and multi-beam e-beam have both missed the 10nm logic node. So for the present, chipmakers must take the brute force route at 10nm by using 193nm immersion with multiple patterning.

Now, it’s time to hit the reset button. For the 7nm node, chipmakers currently are lining up the lithographic competition. As before, with perhaps a slightly different twist, the candidates are EUV, multi-beam and the old standby, 193nm immersion with multiple patterning.

The same candidates also are competing for next-generation DRAM and NAND production. Nanoimprint is vying for a spot in NAND. But another option, directed self-assembly (DSA), could change the entire landscape if chipmakers can bring the technology from the lab to the fab.

Based on the delays with EUV, chipmakers could end up using 193nm with multiple patterning at 7nm. But they also are shuddering at the thought, as the costs and complexities for multiple patterning are enormous.

At 7nm, IC makers would prefer to use EUV or maskless for the critical or cut layers. But after a series of ongoing delays with these next-generation lithography (NGL) candidates, lithographers clearly are frustrated and beginning to run out of patience. “I am not happy with the progress of EUV,” said Burn Lin, vice president of research and development at Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC). “I am also not happy with the progress of maskless, but it is making progress.”

Lin, considered the father of immersion lithography, is the industry’s biggest proponent for multi-beam e-beam. In addition, TSMC has installed an EUV scanner and recently invested in ASML to jumpstart technology. Intel and Samsung also have invested in ASML.

EUV or bust?
For now, chipmakers hope to put EUV in pilot production at the 10nm logic and next-generation memory nodes. At 7nm, EUV remains the leading NGL candidate, with maskless running a distant second. TSMC still has EUV and maskless running neck-and-neck, although both technologies could be used in production for different applications.

To date, the progress with EUV is mixed. ASML Holding’s production-worthy EUV scanner, the NXE:3300B, is ready to roll. The scanner has a numerical aperture (NA) of 0.33 and a resolution of 22nm (half-pitch). ASML plans to ship the first NXE:3300B in the second quarter of 2013, but the throughputs are far less than previously advertised.

The throughput issues are due to the source, which is being developed by Cymer. The development of the EUV source has been “more difficult than what we anticipated,” said David Brandt, senior director of EUV marketing and business development at Cymer, which recently was acquired by ASML.

Last year, Cymer promised to ship a 100 Watt source by the end of 2012. So far, in the lab, Cymer has demonstrated the ability to generate 40 Watts and 50 Watts of EUV power. A 55 Watt source translates to an EUV throughput of 43 wafers an hour.

Cymer’s EUV source is based on laser-produced plasma (LPP) technology. In LPP, plasma is generated by a laser pulse hitting a target. The source also makes use of a pre-pulse laser and a master-oscillator power amplifier (MOPA), which will help generate more EUV power.

By the end of 2013, Cymer hopes to ship an 80 Watt source with a MOPA upgrade, enabling an EUV throughput of 58 wafers per hour. By 2015, ASML hopes to ship an EUV scanner with a 250 Watt source, which translates to a throughput of 126 wafers an hour.

Two other vendors, Gigaphoton and Xtreme, are racing against Cymer to deliver a 250 Watt EUV source. So far, Gigaphoton has achieved an EUV light output equivalent to a maximum of 20 Watts, said Yuji Minegishi, manager of the sales division for the company.

By 2015 or so, the IC industry is expected to be at the 10nm node. EUV is a 13.5nm wavelength technology, meaning chipmakers must use multiple pattering with EUV. With self-aligned double patterning (SADP), ASML’s NXE:3300B has demonstrated resolutions down to 9nm.

But if EUV is used in conjunction with double patterning, the EUV scanner itself will require twice the source power than before—or about 500 Watts, contends TSMC’s Lin. However, to deal with the resists, Yan Borodovsky, a senior fellow and director of advanced lithography at Intel, recently said that EUV source power needs to be in the range of 1,000 Watts.

Another way to extend EUV is by moving to higher NAs. For example, with an NA of 0.45, an EUV scanner can print 9.5nm feature sizes, but the image contrast drops, according to Zeiss. To address that problem, the current 4X magnification scheme can be increased to 6X or 8X.

Current EUV scanners with 4X magnification support standard 6-inch photomasks. A 0.45 NA lens with 6X magnification may improve EUV resolutions, but in some cases, that solution may require the photomask industry to move to a new and larger 9-inch mask size. In other words, photomask tool makers must develop new equipment.

“I don’t think we should give up on 4X just yet,” said Harry Levinson, senior fellow and manager of strategic lithography technology at GlobalFoundries, at the recent SPIE conference. “We may be able to extend 4X a bit. Maybe for a later node, we can go for more of these radical changes, such as larger format masks and higher lens reductions.”

Still, Levinson urged the industry to explore the idea of moving toward 9-inch masks, a move that is less painful than some might think. To support 9-inch reticles, the optics and other critical parts of a photomask tool will not need to be re-engineered, but vendors will need to develop new handling systems, he said.

In another scenario, EUV with 8X magnification could support 6-inch masks, but scanning would be done in a smaller field size. “You put this all together and we get less than half the throughput at 8X than 4X,” he said. “This is not an attractive situation.”

Beam me up
Amazingly, multi-beam e-beam or maskless lithography has seen more delays than EUV. Summarizing the state of multi-beam, Serge Tedesco, lithography program manager at CEA-Leti, said: “It’s a shame. There is a lack of support from the industry, when you compare it to the EUV side. This is one of the reasons why the technology is not mature yet.”

In 2002, for example, Mapper Lithography claimed that within three years it would ship its 13,000-beam tool for the 45nm node. As it turned out, Mapper’s initial production tool, which only will consist of 1,300 beams, won’t ship until the end of 2013.

Two other vendors, KLA-Tencor and Multibeam, are separately developing multi-beam tools. In another major move, Golden Gate Capital, a venture capital firm, recently sold its e-beam company, Vistec, to two different companies.

In one transaction, Raith recently acquired Vistec’s Gaussian e-beam unit, called Vistec Lithography. Vistec Lithography continues to specialize in conventional direct-write applications in the aerospace and military arena.

In a separate move, the Heidenhain Group recently acquired Vistec’s variable shaped beam (VSB) e-beam unit. That operation, Vistec Electron Beam, sells a single-beam e-beam tool based on VSB technology. It also is working on a multi-beam tool based on a variant of VSB called multi-shape beam (MSB), said Ines Stolberg, manager of strategic marketing at Vistec Electron Beam.

Given that MSB is based on proven VSB technology, Vistec Electron Beam may have an advantage over rival multi-beam approaches, said Hans Pfeiffer, principal of HCP Consulting. “This has a greater chance for success,” Pfeiffer said.

Multi-beam’s future still remains unclear, as only two entities, CEA-Leti and TSMC, are basically propping up and supporting the entire industry. CEA-Leti recently launched the Imagine Program, a multinational consortium aimed to bring maskless into production.

TSMC is working with both KLA-Tencor and Mapper. For years, KLA-Tencor has been developing what it calls Reflective Electron Beam Lithography (REBL). REBL makes use of a six-wafer rotary stage and a linear column. The 75-100-KeV design also consists of a CMOS-based digital pattern generator module, a 4,096 x 247 pixel array unit that enables more than 1 million beams at full current.

When operating with the rotary stage, REBL has demonstrated the ability to print 120nm half-pitch resolutions, a modest effort at best. In a static mode, the tool demonstrated 28nm resolutions, said Thomas Gubiotti of KLA-Tencor. A high-throughput version of REBL is due out in 2015.

Rival Mapper is developing a multi-beam tool, which is supposed to consist of 13,260 beams with sub-25nm resolutions. However, the first production tool, dubbed the Matrix 1.1, will consist of only 1,300 beams and a throughput of 1 wafer an hour, according to CEA-Leti. In June, CEA-Leti is expected to receive one of the first Matrix 1.1 tools. First exposures for the Matrix 1.1 are slated for the fourth quarter of 2013.

By 2015 or 2016, the overall goal is to cluster 10 Matrix systems together, enabling an overall throughput of 100 wafers an hour. In terms of the cost-of-ownership (COO), the Matrix runs €1 million for a system with a throughput of 2 wafers per hours, €5 million for 10 wafers an hour, and $50 million euros for a 10-cluster unit.

Probing Lithography
The Imperial College London and Ilmenau University of Technology have made some advances in the development of scanning probe lithography. Claiming resolutions down to 5nm and beyond, the technology combines the best of high-resolution scanning probe and nanoimprint lithography.

Sometimes called dip pen lithography, scanning probe lithography utilizes the same nanoprobe used in an atomic force microscope (AFM). The AFM is used to pattern nanometer-scale features. The AFM also enables the direct write of features into calixarene molecular resist. Then, researchers use a confined, development-less resist removal process via emission of low-energy electrons. An AFM post-imaging process is used for final in-situ inspection.

Researchers demonstrated a tiny pattern written in 10nm 4M1AC6 resists, with 40V bias voltage and 30nC/cm line dose. With the technology, scanning probe lithography could be a candidate for the production of finFETs with silicon nanowires at 10nm resolutions.

Figure 1. (a) Development-less, positive-tone closed-loop scanning probe lithography (SPL) on calixarene-based molecular glass resist, using self-actuating, piezoresistive scanning probes. (b) Scanning electron microscopy image of a corner pattern written in 10nm-thick 4M1AC6 resist, with 40V bias voltage and 30nC/cm line dose.4(c) Atomic force microscopy image of lithographic test features written with 30V bias voltage and a line dose of 32nC/cm (broad lines) and 20nC/cm (small lines), respectively. The image was taken directly after lithography with the same cantilever. Source: SPIE

Researchers also see applications in the development of quantum-effect devices, such as single-electron transistors and quantum-dot structures. Using a combination of lithography and material morphology, researchers have fabricated room-temperature single-electron transistors using e-beams and silicon nanocrystals at about 10nm in size.

DSA Hard Drives
Sputtering has been one of the main techniques to enable magnetic media on today’s hard disk drives. The next round of high-capacity drives could be based on an entirely new technology, including bit-patterned media (BPM) or heat-assisted magnetic recording (HAMR).

HGST, formerly Hitachi Global Storage Technologies, continues to explore the development of BPM. Now owned by Western Digital, HGST has combined directed self-assembly (DSA) and nanoimprint lithography to create large areas of dense patterns of magnetic islands at 10nm widths. In partnership with Molecular Imprints, a nanoimprint lithography vendor, HGST has devised dense patterns of magnetic islands in about 100,000 circular tracks.

Self-assembling molecules, called block copolymers, are composed of segments that repel each other. In self-assembly, a pre-pattern or guide is developed. After polymer patterns are created, a process called line doubling is implemented. This makes the tiny features even smaller, creating two separate lines where one existed before.

The patterns are then converted into templates for nanoimprinting. HGST has combined self-assembling molecules, line doubling and nanoimprinting to make rectangular features as small as 10nm in a circular arrangement. When extended to an entire disk, the nanoimprinting process is expected to create more than 1 trillion discrete magnetic islands.

“We made our ultra-small features without using any conventional photolithography,” said Tom Albrecht, an HGST fellow, on the company’s Web site. “With the proper chemistry and surface preparations, we believe this work is extendible to ever-smaller dimensions.”

Pellicle Island
For years, photomask makers have used a pellicle to protect a mask from particle contamination. Used in the production of today’s photomasks in optical lithography, a pellicle is a thin film material that is stretched on a frame.

One of the problems with extreme ultraviolet (EUV) lithography is that the technology lacks a pellicle. This means that particles could invade an EUV mask, thereby disrupting the photomask flow and threatening the overall viability of EUV. In fact, EUV generally requires a defect-free mask to enable the technology.

To solve the problem, ASML Holding has begun the development of pellicles for EUV masks. There are two possible types of pellicles for EUV masks—grid-supported and free standing. ASML is focusing on the free-standing approach, which itself consists of two materials options—polysilicon and a silicon/molybdenum/niobium multilayer. See slide 26 here.

To make the technology viable, an EUV pellicle must have a transmission rate at 90%. At present, ASML has achieved a transmission rate at 87%. In a simulated test, the pellicle was subjected to a 250 Watt source. “The results are promising,” said Luigi Scaccabarozzi, a research scientist at ASML “There was no damage to the (EUV scanner).”

—Mark LaPedus

By Mark LaPedus
Altera has entered into an agreement for the future manufacturing of its FPGAs based on Intel’s 14nm tri-gate transistor technology. Intel will provide foundry services for the FPGA giant. That puts the processor giant on a collision course in the foundry business against the likes of GlobalFoundries, Samsung, TSMC and UMC

The Altera-Intel deal could change the landscape in the foundry business, in which Intel will likely become a much bigger player in the arena. But does Intel have staying power to remain in the foundry business? Added John Vinh, an analyst from Pacific Crest Securities: Altera’s “foundry agreement with Intel is exclusive for the foreseeable future. We believe Altera will have exclusive access versus Xilinx at 14nm and effectively have the right of first refusal at 10nm. Strategically, we believe this is likely the most significant aspect of this agreement in that it prevents Xilinx from having access.”

At SPIE, ASML Holding disclosed various milestones with its extreme ultraviolet (EUV) lithography technology. ASML’s EUV production tool, dubbed the NXE:3300B, has demonstrated resolutions of 13nm for lines and spaces and 18nm contact holes. In addition, ASML demonstrated a 40-Watt source with dose control and under good collector protection conditions in six 1-hour runs. It also demonstrated a 55-Watt source in a 1 hour run. But that’s a far cry from the eventual goal. By 2015, ASML hopes to deliver a 250-Watt source for the NXE:3300B, thereby enabling a throughput of 126 wafers an hour.

With the help of self-aligned double patterning (SADP), sometimes called spacer, ASML’s NXE:3300B also demonstrated the ability to print lines and spaces down to 9nm. The work was done in conjunction with ASML, Applied Materials and Imec.

At the International Semiconductor Strategy Symposium in Europe (ISS Europe) on Feb. 24-26, the European semiconductor industry discussed 450mm fabs and other chip topics. In addition, European Commissioner Neelie Kroes floated the idea of creating an “Airbus for chips,” a European initiative for the semiconductor industry comparable to the launch of the Airbus in the aviation industry.

Also at ISS Europe, Malcolm Penn, chairman and CEO of Future Horizons, said that the decline of the major European chip makers has been a result of a defeatist attitude, not necessarily fundamental structural issues. He suggests European chip makers should build a 450mm fab jointly and operate it as a foundry.

SEMI has announced the release of “Global Trade War and Peace: Unified Approaches to a Global Solar Energy Solution,” a white paper containing recommendations to move beyond trade litigation and encourage an accelerated path towards dispute resolution.

In case your calendar has turned into a blur, take note: Semicon is near! SEMI, in collaboration with leading investment groups, has announced the Silicon Innovation Forum (SIF). The forum will bridge funding gaps for new and early-stage companies with manufacturing and technology solutions. SIF will be held in conjunction with Semicon West, on July 9 at the Moscone Center in San Francisco.

At the Mobile World Congress in Barcelona, Peregrine Semiconductor rolled out its latest version of its UltraCMOS process technology, dubbed Semiconductor Technology Platform 8 (STeP8). UltraCMOS is a variant of silicon-on-insulator (SOI) technology called silicon-on-sapphire (SoS).

Also in Spain, Skyworks Solutions said it is ramping several antenna-tuning products with leading smartphone manufacturers. The tuning devices are based on SOI technology.

The RATP Group, the fifth-largest urban transport operator worldwide, has awarded Soitec and Philips/Step an LED lighting contract for its metro and network stations.

Soitec and Medina College of Technology have signed a cooperative agreement for concentrating photovoltaic technology in Saudi Arabia.

GT Advanced Technologies has entered into a development and licensing agreement with Soitec to develop and commercialize a hydride vapor phase epitaxy (HVPE) system for producing GaN template substrates.

Mentor Graphics announced record financial results for the company’s fiscal fourth quarter and year ended Jan. 31.

During a conference call, Walden Rhines, chairman and CEO of Mentor, said the quarter was an all-time revenue and EPS record. Rhines also has a mixed forecast for the overall IC industry in 2013. “For next year, the analysts project mid-single-digit growth, but the general attitude is less positive,” he said.

Mentor Graphics rolled out the Kronos Cell Characterization and Analysis platform.

A blogger discusses Applied Materials, saying the company is at the cyclical trough and its prospects should improve with an increase in equipment spending.

Applied Materials announced that Bob Halliday has been named senior vice president and chief financial officer. Halliday previously was executive vice president and chief financial officer of Varian Semiconductor Equipment Associates prior to Applied’s acquisition of the company in November 2011.

Micron Technology announced the Tokyo District Court’s issuance of an order approving Elpida’s plan of reorganization. Elpida’s plan of reorganization calls for Micron to acquire Elpida. In addition, mixed-signal foundry specialist LFoundry has acquired Micron’s fab in Italy.

Whatever happened to Conexant Systems? The chipmaker recently went private to avoid a takeover. Now, the company this week implemented a restructuring agreement. As part of the plan, Conexant voluntarily filed protection under Chapter 11 of the United States Bankruptcy Code.

Photomask maker Photronics has announced its intent to acquire the shares of its majority-owned Taiwan subsidiary, PSMC.

After a loss and a proxy battle, Aetrium is considering options that may include a sale or other disposition of one or both of its reliability test and test handler product groups.

According to IHS, the competitive landscape of the cell-phone integrated circuits business has completely transformed over the past five years, with Qualcomm and Samsung capitalizing on the rise of smartphones and 4G.