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News Stories Archive

Vital Control in Fab Materials Supply-Chains

Expert panel discussion at Critical Materials Council (CMC) conference.

Innovations at 7nm to Keep Moore’s Law Alive

EUV, cobalt contacts, are expected to be introduced at the 7nm node by several semiconductor manufacturers.

Mentor Graphics Joins GLOBALFOUNDRIES FDXcelerator Partner Program

Mentor Graphics Corp. today announced that it has joined GLOBALFOUNDRIES’ FDXcelerator Partner Program.

Linde Korea acquires Air Liquide Korea’s industrial merchant and electronics on-site and liquid bulk air gases business

Linde Korea, a member of The Linde Group, today announced that it has completed the takeover of Air Liquide Korea’s industrial merchant and electronics on-site and liquid bulk air gases business in South Korea.

MRAM Takes Center Stage at IEDM 2016

With good data retention and speed, and medium density, MRAM may have advantages for systems which have large amounts of on-chip SRAM.

High-NA EUV Lithography Investment

ASML funds Zeiss for anamorphic >0.5 NA.

Process Control Deals with Big Data, Busy Engineers

“Engineers are busy, and so you only tell them something they need to know.” Intel’s Steve Chadwick

Mentor Graphics Signs Agreement with ARM to Accelerate Early Hardware/Software Development

Mentor Graphics Corporation (NASDAQ: MENT) has signed a multiyear license agreement with ARM to gain early access to a broad range of ARM Fast Models, Cycle Models and related technologies.

Has SOI’s Turn Come Around Again?

Analysts see another chance for Silicon-on-Insulator technology, as proponents claim technical and cost advantages for fully-depleted SOI.

D2S Releases 4th-Gen IC Computational Design Platform

14 installations of GPU-accelerated platforms aid mask-makers worldwide