As any design engineer knows, the farther downstream a design goes, the less likely a manufacturing problem can be corrected without a costly and time-consuming redesign.
Latch-up in CMOS circuits is a long-studied and troubling phenomenon that often leads to chip failure through the inadvertent creation of parasitic PNP and NPN junctions being driven (turned on/forward-biased).
I remember back in the day at high school dances, always wanting to dance with the most popular girl in school. I never could, because there were a constant stream of others queued up to dance with her. If you are trying to build an integrated circuit (IC) today, and trying to get fab capacity at 28nm and above, you are faced with the very same situation.
Not that long ago, all designers had for integrated circuit (IC) reliability verification was a plethora of home-brewed scripts and utilities they combined with traditional design rule checking (DRC), layout vs. schematic (LVS) comparison, and electrical rule checking (ERC) tools.
The annual growth for car sales is typically in the single digits, but the electronic content inside those cars is rapidly expanding as we enter the age of the digital car.
The safety net of design margins that were once available to designers has disappeared. Whether you’re implementing a new design start at your “next” node or an established node, the desire for greater functionality has eroded what margins used to exist.
With the widespread use of system-on-chip (SoC) designs, efficient integrated circuit (IC) design and validation is now a team sport.
Successful design of highly-integrated IoT systems requires simulating MEMS components together with the peripheral circuitry.
Has debugging double patterning (DP) errors got you pulling your hair out, or wishing you had pursued that career in real estate, like your mom suggested? Now you can unlock the secrets of DP debugging in five easy steps! Once you learn these steps, you’ll be the envy of your team, as you deliver clean DP designs on schedule, and still have time to eat lunch each day!
Electromigration (EM) is the transport of material caused by the gradual movement of the ions in a conductor, due to the momentum transfer between conducting electrons and diffusing metal atoms.