Comments for Semiconductor Manufacturing & Design Community http://semimd.com Deep Insights for Chip Builders Thu, 25 Apr 2013 16:16:36 +0000 hourly 1 http://wordpress.org/?v= Comment on Moving On Two Fronts by Chris Schuermyer http://semimd.com/blog/2013/04/18/moving-on-two-fronts/#comment-47657 Chris Schuermyer Thu, 25 Apr 2013 16:16:36 +0000 http://semimd.com/?p=8249#comment-47657 I wonder what Noonen means by “20nm will be a fast ramp,”. Is that because of the ability to quickly ramp a process based on lessons learned from 28nm or is it because there will be so much demand there isn't time to waste? I wonder what Noonen means by “20nm will be a fast ramp,”. Is that because of the ability to quickly ramp a process based on lessons learned from 28nm or is it because there will be so much demand there isn’t time to waste?

]]> Comment on Making An Impression with Nanoimprint by mark http://semimd.com/blog/2013/03/21/making-an-impression-with-nanoimprint/#comment-47108 mark Tue, 23 Apr 2013 22:15:06 +0000 http://semimd.com/?p=8072#comment-47108 EV Group, Nanonex, MII, Obducat and Suss are among the players in the nanoimprint market. Some NIL vendors focus on semis. Most look at a broad spectrum of markets, such as optical devices, displays, storage, biotech, ICs and advanced materials. EV Group, Nanonex, MII, Obducat and Suss are among the players in the nanoimprint market. Some NIL vendors focus on semis. Most look at a broad spectrum of markets, such as optical devices, displays, storage, biotech, ICs and advanced materials.

]]> Comment on Beam Me Up by Diogenes Cicero http://semimd.com/blog/2012/10/18/beam-me-up/#comment-46802 Diogenes Cicero Mon, 22 Apr 2013 16:09:49 +0000 http://semimd.com/?p=7200#comment-46802 Dr. Gotkis, The two statements in your note above are clearly not in "absolute contradiction". I was referring to silicon EBDW and Dr. Kalk was clearly referring to mask making. He is hoping (or praying) that the players (and I use the term advisedly) in the EBDW market will direct enough effort to mask writing to one day develop a reasonably priced tool which can write a 10nm mask (40nm at 4X) with egregious OPC in 4 hours instead of 4 days. IMS seems inclined to focus on mask writers. Most others continue to be drawn to the sexy siren of silicon. Dr. Gotkis, The two statements in your note above are clearly not in “absolute contradiction”. I was referring to silicon EBDW and Dr. Kalk was clearly referring to mask making. He is hoping (or praying) that the players (and I use the term advisedly) in the EBDW market will direct enough effort to mask writing to one day develop a reasonably priced tool which can write a 10nm mask (40nm at 4X) with egregious OPC in 4 hours instead of 4 days. IMS seems inclined to focus on mask writers. Most others continue to be drawn to the sexy siren of silicon.

]]> Comment on The Week In Review: April 22 by Kent Dahlgren http://semimd.com/blog/2013/04/22/the-week-in-review-april-22/#comment-46799 Kent Dahlgren Mon, 22 Apr 2013 15:46:35 +0000 http://semimd.com/?p=8255#comment-46799 "Outside of programmable logic devices (PLDs), isn’t everybody of significance already using ARM?” All of the major PLD vendors have devices with ARM cores. This includes Altera which announced a foundry relationship with Intel. “Outside of programmable logic devices (PLDs), isn’t everybody of significance already using ARM?”

All of the major PLD vendors have devices with ARM cores. This includes Altera which announced a foundry relationship with Intel.

]]> Comment on Making An Impression with Nanoimprint by Hardy http://semimd.com/blog/2013/03/21/making-an-impression-with-nanoimprint/#comment-46681 Hardy Sun, 21 Apr 2013 21:59:28 +0000 http://semimd.com/?p=8072#comment-46681 Are there any other companies in the nanoimprint business? Are there any other companies in the nanoimprint business?

]]> Comment on CMOS And SOI Invade RF Front End by Interested_reader http://semimd.com/blog/2013/04/18/cmos-and-soi-invade-rf-front-end/#comment-46573 Interested_reader Sun, 21 Apr 2013 06:35:28 +0000 http://semimd.com/?p=8180#comment-46573 What about Intel's monolithic radio work? Rattner talked about it a lot at IDF 2012. How does that compare? What about Intel’s monolithic radio work? Rattner talked about it a lot at IDF 2012. How does that compare?

]]> Comment on Beam Me Up by Yehiel Gotkis http://semimd.com/blog/2012/10/18/beam-me-up/#comment-46256 Yehiel Gotkis Thu, 18 Apr 2013 22:49:39 +0000 http://semimd.com/?p=7200#comment-46256 Diogenes, hi, Assuming that you were not directly involved these days in the modern DW EBL development, but nevertheless took the bravery of making tthe following statement "... illusory EBDW silicon market. EBDW will simply never be a mainstream lithography technology." even though it is in an absolute contradiction with this one: “Multibeam is a disruptive writing technology,” by Toppan’s Franklin Kalk. I was deeply involved in this R&D field, and would like to make a compliment to your strong sense of intuition. Franklin is also right about DW EBL being disruptive, however only partially,- because it is a kind of self-disruption. The more responses come from the DW EBL R&D actions, the more clear it becomes that these are convulsive rather than rational productive activity, indicating that there is no chance this rough and full of contradictions surrealistic PPT idea can ever give birth to a somewhat viable production worthy technology. I was involved in the DW EBL (REBL) R&D and currently am running numerous discussions on this matter, and this is my solid opinion:" There is no way even a single production wafer will be ever processed with considerable involvement of the DW EBL technology." So, Diogenes, we are synchronized on this, and please accept my compliments regarding your great intuitive thinking Diogenes, hi,
Assuming that you were not directly involved these days in the modern DW EBL development, but nevertheless took the bravery of making tthe following statement “… illusory EBDW silicon market. EBDW will simply never be a mainstream lithography technology.” even though it is in an absolute contradiction with this one: “Multibeam is a disruptive writing technology,” by Toppan’s Franklin Kalk. I was deeply involved in this R&D field, and would like to make a compliment to your strong sense of intuition. Franklin is also right about DW EBL being disruptive, however only partially,- because it is a kind of self-disruption. The more responses come from the DW EBL R&D actions, the more clear it becomes that these are convulsive rather than rational productive activity, indicating that there is no chance this rough and full of contradictions surrealistic PPT idea can ever give birth to a somewhat viable production worthy technology.

I was involved in the DW EBL (REBL) R&D and currently am running numerous discussions on this matter, and this is my solid opinion:” There is no way even a single production wafer will be ever processed with considerable involvement of the DW EBL technology.”

So, Diogenes, we are synchronized on this, and please accept my compliments regarding your great intuitive thinking

]]> Comment on CMOS And SOI Invade RF Front End by Len Forbes http://semimd.com/blog/2013/04/18/cmos-and-soi-invade-rf-front-end/#comment-46232 Len Forbes Thu, 18 Apr 2013 18:20:42 +0000 http://semimd.com/?p=8180#comment-46232 the SOITECH solution for silicon-on-sapphire is OK but not the best possibilty; I have a patented an easily implemented solution for both SOI and bulk CMOS on the same wafer that allows designers to use TSMC design rules for at least the bulk CMOS portion. this is based in part on my 1992 work on SOS (with Peregrine people)and more recently work on BSI imagers; 8420438 16 April 2013. the SOITECH solution for silicon-on-sapphire is OK but not the best possibilty; I have a patented an easily implemented solution for both SOI and bulk CMOS on the same wafer that allows designers to use TSMC design rules for at least the bulk CMOS portion.

this is based in part on my 1992 work on SOS (with Peregrine people)and more recently work on BSI imagers; 8420438 16 April 2013.

]]> Comment on Foundry Models In Transition by Chris Schuermyer http://semimd.com/blog/2013/04/18/not-your-fathers-chip-foundries/#comment-46230 Chris Schuermyer Thu, 18 Apr 2013 18:04:28 +0000 http://semimd.com/?p=8215#comment-46230 Another interesting aspect of foundries are their 'Design Services' organizations. This seems to be a place where foundries are pushing from pure-play manufacturing into semiconductor design as well. It would be interesting to know how these organizations are growing relative to the manufacturing arms. Another interesting aspect of foundries are their ‘Design Services’ organizations. This seems to be a place where foundries are pushing from pure-play manufacturing into semiconductor design as well. It would be interesting to know how these organizations are growing relative to the manufacturing arms.

]]> Comment on Swimming In Data by Chris Schuermyer http://semimd.com/blog/2013/03/21/swimming-in-data/#comment-44941 Chris Schuermyer Tue, 09 Apr 2013 17:23:38 +0000 http://semimd.com/?p=8092#comment-44941 It seems like having a abstracted view of the CD-SEM data is a great value add insofar as reducing data volume while minimizing the reduction in information. I wonder if there is any way to measure the impact of this abstraction. What tools are consuming this data, and does the accuracy go up because they don't have so much data volume to deal with, or does the accuracy go down because of the assumptions made in the abstraction. It seems like having a abstracted view of the CD-SEM data is a great value add insofar as reducing data volume while minimizing the reduction in information. I wonder if there is any way to measure the impact of this abstraction. What tools are consuming this data, and does the accuracy go up because they don’t have so much data volume to deal with, or does the accuracy go down because of the assumptions made in the abstraction.

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