Part of the  

Solid State Technology


The Confab


About  |  Contact



Double Patterning From Design Enablement To Verification

Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions, including:

  • DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts.
  • Effects on place and route (P&R) and new reqirements for physical design.
  • Why LELE DP cuts and overlaps are critical to optical process correction (OPC).
  • Mask misalignment and image rounding as new verification considerations.

To download this white paper, click here.

Tags: , , , ,

Leave a Reply

Extension Media websites place cookies on your device to give you the best user experience. By using our websites, you agree to placement of these cookies and to our Privacy Policy. Please click here to accept.