http://semimd.com/blog/2012/07/31/dsa-moves-to-rd-pilot-lines/ Deep Insights for Chip Builders Thu, 25 Apr 2013 16:16:36 +0000 hourly 1 http://wordpress.org/?v= http://semimd.com/blog/2012/07/31/dsa-moves-to-rd-pilot-lines/#comment-28773 mp Wed, 01 Aug 2012 04:07:37 +0000 http://semimd.com/?p=6545#comment-28773 The rise of DSA as a multi-patterning technique and the increasing difficulty of EUV as a single patterning technique are no coincidence. The rise of DSA as a multi-patterning technique and the increasing difficulty of EUV as a single patterning technique are no coincidence.

]]> http://semimd.com/blog/2012/07/31/dsa-moves-to-rd-pilot-lines/#comment-28768 mp Wed, 01 Aug 2012 02:09:04 +0000 http://semimd.com/?p=6545#comment-28768 EUV was supposed to be used as single patterning. As a complementary second exposure it is really too expensive. EUV was supposed to be used as single patterning. As a complementary second exposure it is really too expensive.

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