Direct-write E-beam Program Claims Progress
French research institute CEA-Leti (Grenoble, France) reported progress at its multi-partner direct-write e-beam lithography program, based on the massively parallel direct write technology developed by Delft, Netherlands-based Mapper Lithography. The program has printed 22nm dense lines and spaces and 22 nm dense contact holes, which CEA-Leti said “meets the needs of the 14nm and 10nm logic technology nodes.”
CEA-Leti and Mapper, along more than a dozen other partners including TSMC and STMicroelectronics, are developing direct-write lithography in the Imagine R&D program, using a Mapper tool with 110 electron beams.
Though the timetable was not announced, the program said it will install one of Mapper’s first pre-production Matrix systems, offering the ability “to assess maskless lithography technology in a real manufacturing environment.”
Mapper CEO Bert Jan Kampherbeek said Mapper’s Matrix pre-production platform will be completed in 2012, with “initially a one wafer per hour throughput capability and scalable to 10 wafers per hour.” The company employs 190.
The partners in the Imagine program participated in the Fifth Operational Review on Jan. 24-26 in Grenoble, with more than 50 representatives from 13 different companies attending. Laurent Pain, coordinator of the Imagine program and manager of the CEA-Leti lithography laboratory, announced a three-year extension of the Imagine program.
(Source: Imagine program at CEA-Leti)
Tags: CEA-Leti, Direct write e-beam, E-beam, Mapper Lithography