Mentor, JEOL Explore Shot Reduction for E-beams
For years, electron-beam tools have been used to write the critical layers for a photomask. But these machines have been considered too slow and a bottleneck in mask production.
In a deal that could reverse that trend, Mentor Graphics Corp. and JEOL Ltd. have announced an agreement to collaborate on technology that promises to boost e-beam writing speeds.
The companies are currently engaged in a research program to demonstrate the feasibility of a technology called multi-resolution writing for shot count reduction of up to 30 percent.
The new agreement between Mentor and JEOL is focused on developing this technology as well as providing interfaces between the Mentor mask data preparation and mask process correction (MPC) software and JEOL’s e-beam equipment.
The new multi-resolution writing work is enabling patterns “shot” onto the mask blank to alternate between detailed and simplified versions for each pass in a multi-pass, vector e-beam writing system, saving mask writing times, according to the companies.
The Mentor mask process correction software helps ensure the correct image is ultimately printed from the sum of exposures. Previously, Mentor and JEOL worked jointly on developing solutions to correct process effects associated with 50 keV ebeam mask writing and on demonstration of the dose encoding algorithm used within the JEOL data specification.
The new agreement collaboration covers the full Mentor Calibre mask data prep product line, and the JEOL JBX-3200MV, JBX-30XXMV and JBX-9000MV mask writer series products.
“Our customers have already seen the benefits of our work with Mentor Graphics on improvements in mask quality and faster mask write times at advanced nodes,” said Wataru Wakamiya, corporate officer and general manager of the Semiconductor Business Unit at JEOL.
“Over the years our collaboration has resulted in significant innovations and reliable solutions for our mutual customers, and this agreement will help to maintain the alignment between Mentor software and JEOL hardware as both our product lines evolve to handle new technology nodes,” said Joseph Sawicki, vice president and general manager of the Mentor Design to Silicon division.
