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Archive for July, 2014

Applied Materials Recognized for Leading Green Power Use by EPA

Wednesday, July 30th, 2014

Applied Materials is pleased to be recognized once again for our commitment to green energy. In the U.S. Environmental Protection Agency’s (EPA) Green Power Partnership report released this week, Applied ranked No. 82 on National Top 100 list of the largest green power users, No. 13 on the list of Top 30 Tech & Telecom companies and No. 26 on the FORTUNE 500 list.

At Applied we use more than 67 million kilowatt-hours (kWh) of green power annually, which is equivalent to avoiding the carbon dioxide (CO2) emissions of nearly 10,000 passenger vehicles per year, or the CO2 emissions from the electricity use of more than 6,000 average American homes.

We purchase a utility green power product from Austin Energy and Silicon Valley Power. In addition, we generate our own green power from on-site solar energy systems. Last year also marked the first time that Applied’s headquarters in Santa Clara, California harnessed 100% of its power from green energy purchases.

Applied Materials remains dedicated to the generation and use of renewable energy, including clean energy installations at several of our facilities in the U.S., Europe and Asia, as well as supplementing energy requirements through green power purchases from local utility companies.

In 2013, approximately 25% of Applied’s total energy consumed worldwide was from renewable sources, including solar and wind power produced on-site at our facilities. The company’s on-site renewable energy generation also increased by 140% in 2013 compared to 2012, driven by a 2.5 megawatt wind turbine installed at our Gloucester, Massachusetts site, which produced 7.1 GWh of energy and powered more than 25% of the campus. In addition, solar photovoltaic panels installed at company sites in Switzerland, Singapore and China generated nearly 3.6 GWh of energy.

To learn more about our environmental stewardship, sustainable business practices and community investment, read our Citizenship Report.

New Lithography Technologies Gain a Foothold

Monday, July 14th, 2014

By Connie Duncan

Historically, many of the developments in the semiconductor industry have stemmed from the continued progress in lithography. However, with the persistent uncertainty of extreme ultraviolet (EUV) for future-generation patterning, the industry has developed techniques such as self-alignment double patterning (SADP) to extend optical lithography. In a video produced by SPIETV, Chris Bencher of Applied Materials Office of the Chief Technology Officer, reviews the evolution of SADP and looks to its future.  He starts with SADP first being adopted for fabricating NAND flash memory products and explains why it is increasingly attractive for other applications. These include SADP for DRAM, logic 3D designs and for contact patterning at advanced design nodes. Lastly, Chris discusses the prospects of quad-patterning and nano-imprint, highlighting the innovativeness of the industry.

Click here to view video.

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